摘要： 介绍了射频阻抗匹配的基本原理和常见的匹配网络类型，以串并联电容组成的Г型匹配网络为例，利用史密斯圆图，阐述了阻抗匹配的工作原理。介绍射频等离子技术在微电子工艺设备中的应用。给出了自动匹配网络的检测电路、电机驱动电路和控制电路，提出了优化自动阻抗匹配能力的方法。

中图分类号： TN405
文献标识码： A
DOI：10.16157/j.issn.0258-7998.200439
中文引用格式： 赵英伟，张文雅，郝晓亮. 射频等离子工艺设备中的自动阻抗匹配技术[J].电子技术应用，2020，46(10)：61-63，78.
英文引用格式： Zhao Yingwei，Zhang Wenya，Hao Xiaoliang. The impedance automatch method in radiofrequency plasma processing equipment[J]. Application of Electronic Technique，2020，46(10)：61-63，78.

The impedance automatch method in radiofrequency plasma processing equipment

Abstract： The basic principle of RF impedance matching and some matching network types are introduced.A Г type matching network composed of series and parallel capacitors is taken as an example to explain the principle of inpedance matching by using Smith chart.The application of RF plasma technology in microelectronic process equipment is introduced.The detection circuit,motor drive circuit and control circuit are introduced.A method to optimize automatic matching ability is proposed.

Key words : plasma；automatch；RF；phase；magenitude